Nonlinear O pressure dependence of the initial oxide growth kinetics on Si(111) surfaces; Photoelectron spectroscopy observation and molecular orbital calculation of oxidation states

Si(111)表面酸化膜形成初期過程における非線形酸素圧力依存; 酸化状態の光電子分光観察と分子軌道計算

Tang, J.*; 西本 究*; 小川 修一*; 吉越 章隆 ; 石塚 眞治*; 渡辺 大輝*; 寺岡 有殿; 高桑 雄二*

Tang, J.*; Nishimoto, Kiwamu*; Ogawa, Shuichi*; Yoshigoe, Akitaka; Ishizuka, Shinji*; Watanabe, Daiki*; Teraoka, Yuden; Takakuwa, Yuji*

Oxygen pressure dependence of the initial oxide growth kinetics on Si(111)- 77 surfaces has been investigated by real-time photoelectron spectroscopy and molecular orbital (MO) calculations. A nonlinear relationship between initial oxidation rate and oxygen pressure was found, which is quite different from the linear results on Si(001)-2771 surfaces. It was also observed that a larger amount of oxygen adsorption species 3 were formed in the Si(111)-77 subsurface at higher leading to an obstacle for the diffusion of O atoms into Si bulk due to its high potential energy barrier. Further a reaction path of oxygen adsorption states on Si(111)- 77 surfaces at room temperature was proposed based on the experimental and theoretical calculation results.