Fabrication of microstructures embedded in SC-CVD diamond with a focused proton microbeam

集束イオンマイクロビームを利用した単結晶CVDダイヤモンド中への埋め込み型微小構造の形成

加田 渉*; 神林 佑哉*; 三浦 健太*; 猿谷 良太*; 久保田 篤志*; 佐藤 隆博; 江夏 昌志; 神谷 富裕; 花泉 修*

Kada, Wataru*; Kambayashi, Yuya*; Miura, Kenta*; Saruya, Ryota*; Kubota, Atsushi*; Sato, Takahiro; Koka, Masashi; Kamiya, Tomihiro; Hanaizumi, Osamu*

Micro-processing procedures have been extensively studied using a Proton Beam Writing (PBW) technique in order to fabricate two or three dimensional microscopic patterns in single-crystal chemical vapor deposition (SC-CVD) diamonds. In this study, various microscopic patterns were drawn on SC-CVD diamonds (3.0 mm 3.0 mm 0.5 mm IIa single-crystal) at various fluences with PBW using 0.75 and 3 MeV proton beams. The beam conditions of PBW other than the beam energy were as follows; a beam size of 1 m, a scanning area of 800 m 800 m and beam current of up to 100 pA. From the result of the observations based on the optical and electrical modification of SC-CVD, the microscopic patterns were fabricated in the diamonds by the micro-processing procedure varying fluence and beam energy. This result demonstrated that the micro-processing procedure with PBW enables us to fabricate the two or three dimensional microscopic patterns, which are optically and electrically modified, in SC-CVD diamonds by optimizing fluence and beam energy.