Perfluorinated polymer film with functional group prepared by radiation-induced grafting

官能基を有する全フッ素系高分子膜の放射線グラフト重合法による合成

Zhai, M.; Chen, J.; 長谷川 伸; Li, D.; 奥 浩之*; 前川 康成

Zhai, M.; Chen, J.; Hasegawa, Shin; Li, D.; Oku, Hiroyuki*; Maekawa, Yasunari

放射線を用いた同時照射グラフト法において、その線量,温度,環境を検討することで、官能基を有する全フッ素系高分子膜の合成に初めて成功した。線550kGy照射することで、化学変換できる臭素を含む全フッ素系モノマーである2-bromotetrafluoroethyl trifluorovinyl etherを、全フッ素系高分子膜であるテフロン膜にグラフト率20%以上でグラフト重合できた。グラフト鎖は膜内均一に導入されていることが赤外分光法やSEM-EDS法により確認できた。さらに、熱重量分析より、グラフト鎖が相分離しているが高い耐熱性を維持していることがわかった。

A perfluorinated vinyl ether monomer, 2-bromotetrafluoroethyl trifluorovinyl ether (BrTFF) was grafted into crosslinked poly(tetrafluoroethylene) (cPTFE) films by -rays irradiation under different conditions. The irradiation with absorbed doses more than 550 kGy gave the poly(BrTFF) grafted cPTFE membranes with grafting yields of more than 20%. FTIR spectra and SEM-EDS testified that BrTFF was successfully grafted into cPTFE films homogeneously in the film perpendicular direction. TGA analysis of the grafted films indicated that the perfluorinated poly(BrTFF) grafts were phase-separated from the PTFE region due to the crosslinked structure of the cPTFE based film, but the grafted films still had high thermal stability (above 300 C). The grafted film, a new kind of perfluorinated polymer with bromine active groups and good mechanical properties, is expected to be modified for new applications.