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論文

Development of embedded Mach-Zehnder optical waveguide structures in polydimethylsiloxane thin films by proton beam writing

加田 渉*; 三浦 健太*; 加藤 聖*; 猿谷 良太*; 久保田 篤志*; 佐藤 隆博; 江夏 昌志; 石井 保行; 神谷 富裕; 西川 宏之*; et al.

Nuclear Instruments and Methods in Physics Research B, 348, p.218 - 222, 2015/04

 被引用回数:6 パーセンタイル:39.55(Instruments & Instrumentation)

The Mach-Zehnder (MZ) optical structures were previously fabricated in a Poly-methyl-methacrylate (PMMA) thin film by Proton Beam Writing (PBW). The enhancement of optical transmittance in the structures is, however, required for industrial use. In this study, the MZ optical waveguides have been fabricated in a poly-dimethyl-siloxane (PDMS) thin film which has the higher optical permeability. The PDMS films were spin-coated on a silicon wafer (40 $$times$$ 20 $$times$$ 0.5 mm$$^3$$) with a thickness of approximately 30 $$mu$$m. The MZ waveguides were drawn by a 750 keV proton microbeam of 1$$mu$$m in diameter having the penetration depth of 18 $$mu$$m with fluence of 40-100 nC/mm$$^2$$. The beam writing was carried out combining an electric scanner and a mechanical sample-stage. The observation of the single-mode light propagation of 1.55 $$mu$$m fiber-laser in the MZ waveguides indicated that the optical transmittance have been successfully enhanced using PDMS.

論文

Electroplating of Ni microstructures on the cross section of Cu wire using PMMA mother fabricated by proton beam writing

田邊 祐介*; 岩本 隆志*; 高橋 潤一*; 西川 宏之*; 佐藤 隆博; 石井 保行; 神谷 富裕

JAEA-Review 2012-046, JAEA Takasaki Annual Report 2011, P. 129, 2013/01

In this study, the Ni microstructures were attempted to be fabricated on a distal surface of Cu wires with a diameter of 1.0 mm aiming at the use for imprint lithography. Firstly a PMMA master block was fabricated on the distal surface by exposing PB with beam size of 1.1 $$mu$$m at 3.0 MeV and developing it by IPA-water for electroplating. The master block was composed of the 4-$$mu$$m wide lines with pitches of 25 $$mu$$m and depths of 20 $$mu$$m. Secondly the electroplating was performed on the PMMA master block using a nickel sulfamate bath. Thirdly the electroplated Ni surface was mechanically polished easily to remove PMMA by smoothing its surface. Finally, the Ni microstructures with 20.5 $$mu$$m were fabricated by removing the PMMA after polishing. We additionally performed UV imprint lithography of the photosensitive polymer using the Ni microstructures as a mold. The observation result of SEM images of Ni microstructures and UV imprinted grooves showed that their imprinted grooves were successfully transferred by way of the Ni microstructures from the PMMA master block using the combination of the electroplating and imprinting.

論文

Visualization of focused proton beam dose distribution by atomic force microscopy using blended polymer films based on polyacrylic acid

大道 正明*; 高野 勝昌*; 佐藤 隆博; 神谷 富裕; 石井 保行; 大久保 猛; 江夏 昌志; 加田 渉; 杉本 雅樹; 西川 宏之*; et al.

Journal of Nanoscience and Nanotechnology, 12, p.7401 - 7404, 2012/09

 被引用回数:2 パーセンタイル:86.39(Chemistry, Multidisciplinary)

A new visualization method for dose distribution of a focused proton beam in sub-micrometer scale was developed using a formation of a bulky cross-linked structure of polyacrylic acid -$$N$$, $$N$$'-methylence bisacrylamide, blend film. The areas irradiated by the focused proton beam were swelled on the film. The height of the swelling was significantly increased according to the beam fluence and the increase of containing ratio of the methylence bisacrylamide. The height was saturated at the fluence of 5$$times$$10$$^5$$ ions/$$mu$$m$$^{2}$$. The proton beam-sensitive polymer film was used for the analysis of dose distribution on its surface. The irradiated surface was observed by employing an atomic force microscope. This observation result showed that the method could be used to confirm the writing patterns and the beam-spot shape. Nanostructures with a crescent shape are visualized clearly at a misaligned beam-spot shape in the set up of the beam-optics.

論文

Microprocessing of arched bridge structures with epoxy resin by proton beam writing

高野 勝昌*; 麻野 敦資*; 前吉 雄太*; 丸井 裕美*; 大道 正明*; 佐伯 昭紀*; 関 修平*; 佐藤 隆博; 石井 保行; 神谷 富裕; et al.

Journal of Photopolymer Science and Technology, 25(1), p.43 - 46, 2012/07

 被引用回数:2 パーセンタイル:91.53(Polymer Science)

The proton beam writing (PBW) with energy of several MeV ranges is a unique tool of three-dimensional microprocessing for a polymer material. Three-dimensional structures like a bridge structure can be fabricated by the double exposures of PBW with two deferent energies followed by the one-time development using etching solution. In this study, the fabrication of an arched bridge was attempted by means of the supercritical drying with liquid carbon dioxide to a SU-8 photoresist film, as the polymer material, coated on a substrate of epoxy sheet, after the PBW process. In the exposures, two patterns of bridge girders and piers were written with 0.5 and 3 MeV proton beams to the SU-8 photoresist films, respectively. After these writings, the photoresist films were developed with the solution of diacetone alcohol and rinsed with the solution of isopropyl alcohol. Then the supercritical drying with liquid carbon dioxide was used at 12 MPa, 40$$^{circ}$$C. As the results, the bridge structures with curved girders to the vertical direction were formed due to the swelling effect of the photoresist film on the drying. In the conference, the microprocessing method of the bridge structure and the swelling effect of the photoresist film will be represented in detail.

論文

Fabrication of concave and convex structure array consisted of epoxy long-nanowires by light and heavy ion beams lithography

高野 勝昌*; 杉本 雅樹; 麻野 敦資*; 前吉 雄太*; 丸井 裕美*; 大道 正明*; 佐伯 昭紀*; 関 修平*; 佐藤 隆博; 石井 保行; et al.

Transactions of the Materials Research Society of Japan, 37(2), p.237 - 240, 2012/06

A three dimensional microfabrication technique for polymer films has been investigated on the basis of fabricating micrometer structures composed of the fine wire structures which were fabricated by the chemical reaction induced along ion tracks of heavy ions with the energy of hundred MeV. In this study, we propose a new hemispherical microfabrication technique of epoxy resin for the fabrication of optical lenses using two times irradiation technique combining proton beam writing and low fluence irradiation of heavy ion beam. At first, an epoxy resin films composed of an etching and a non-etching layers of epoxy resin were irradiated at a frame pattern using a 3 MeV focused proton beam. At second, the low fluence irradiation of 450 MeV $$^{129}$$Xe$$^{23+}$$ was performed by a raster line scanning with oblique angle of 45 degree. Finally, the non-irradiated area of the etching layer of the films were etched by the developer. The observation of the etched films showed that the dome-like structures arrayed with a grid were formed on the non-etching layer of the epoxy resin films. The more detailed observation showed that each dome was composed of the fine wire structures formed by cross-linking reactions induced along the $$^{129}$$Xe$$^{23+}$$ tracks. The domes are expected to function as optical condenser-lenses.

論文

Fabrication of poly(9,9'-dioctylfluorene)-based nano- and microstructures by proton beam writing

前吉 雄太*; 高野 勝昌*; 麻野 敦資*; 丸井 裕美*; 大道 正明*; 佐藤 隆博; 神谷 富裕; 石井 保行; 大久保 猛; 江夏 昌志; et al.

Japanese Journal of Applied Physics, 51(4R), p.045201_1 - 045201_4, 2012/04

 被引用回数:1 パーセンタイル:94.61(Physics, Applied)

A relation between the fluence and the beam-induced chemical reaction in poly(9,9'-dioctylfluorene), PFO, films has been investigated to fabricate PFO-based nano-micro structures using Proton Beam Writing, PBW. In this investigation, we observed that the cross-linking reaction in PFO occurred without a cross-linking agent using PBW. Furthermore, not only the surface morphology but also structure and shape on PFO films were changed from nano-meter to micro-meter size by controlling the fluence of proton beam irradiation on the basis of the investigation. Consequently, the structure of the arabic numbers was successful fabricated as three-dimensional PFO structures with the aspect ratio of 12 at the fluence of 3.5 $$times$$ 10$$^6$$ ions/$$mu$$m$$^2$$ by PBW.

論文

3D micro-fabrication utilized superimposing technique with focused MeV ion beams

高野 勝昌*; 佐藤 隆博; 神谷 富裕; 石井 保行; 大久保 猛; 江夏 昌志; 加田 渉; 杉本 雅樹; 関 修平*; 西川 宏之*

JAEA-Review 2011-043, JAEA Takasaki Annual Report 2010, P. 162, 2012/01

A unique micro-processing technique for epoxy resin films has been developed at the TIARA, utilizing the ion beam writing with multiple energies of light and heavy ion beams. In this study, nano-wire structure fabrication was tried by a superimposing with the proton beams and 520 MeV $$^{40}$$Ar$$^{14+}$$. And in order to reduce the surface tension in developing and drying processes, after a baking at 95 $$^{circ}$$C for 1 minute, developing and drying was performed with super-critical CO$$_{2}$$ at 12 MPa, 40 $$^{circ}$$C. As the result, the bridge structure which strung the wires fabricated by 520 MeV $$^{40}$$Ar$$^{14+}$$ hitting can be observed at the aimed points.

論文

Electroforming of Ni mold using high-aspect-ratio PMMA microstructures fabricated by proton beam writing

田邊 祐介*; 西川 宏之*; 佐藤 隆博; 石井 保行; 神谷 富裕

JAEA-Review 2011-043, JAEA Takasaki Annual Report 2010, P. 163, 2012/01

We report on Ni electroforming using high-aspect-ratio PMMA microstructures by Proton Beam Writing (PBW). There are several issues to be addressed in the fabrication process of Ni molds with a high-aspect-ratio using the PMMA microstructures. First, the residual PMMA was observed on the sidewall of PMMA master block by increasing the thickness of its master block. Second, the small voids were formed in the Ni molds when the high-aspect ratio PMMA master blocks were used. These problems ware resolved using the PMMA master blocks fabricated by PBW on the condition of the higher dose exposure than ordinal one and using a seed layer of a 600-$$mu$$m thick Cu substrate evaporated on the Si substrate before spin-coating the PMMA film. The 30-$$mu$$m PMMA master block with the aspect ratio of 30 was successfully fabricated using the above procedures. Using this PMMA master block, the Ni mold with 30-$$mu$$m thick on the Cu substrate was successfully electroformed without voids from the observation of the cross section revealed by a FIB. Furthermore, a Ni mold with grids and circle patterns was also successfully fabricated using a 15-$$mu$$m thick PMMA film spin-coated on a Cu substrate. The result of the thermal imprint using the Ni mold demonstrated that the high aspect structure was transferred on a PMMA film without damages of the Ni mold even after many trials.

論文

Fabrication of polymer optical waveguides for the 1.5-$$mu$$m band using focused proton beam

三浦 健太*; 町田 裕貴*; 上原 政人*; 桐生 弘武*; 小澤 優介*; 佐々木 友之*; 花泉 修*; 佐藤 隆博; 石井 保行; 江夏 昌志; et al.

Key Engineering Materials, 497, p.147 - 150, 2011/12

 被引用回数:6 パーセンタイル:2.48

Single mode straight waveguides for a wavelength of 1.55-$$mu$$m were, so far, fabricated using a proton beam writing (PBW) technique. We report the fabrication of Y-junction polymer waveguides with a polymethyl methacralate (PMMA) layers as the expansion of these straight waveguides using PBW in the conference. The PMMA layers consisted of an under-cladding layer of SiO$$_2$$ having a thickness of $$sim$$ 15-$$mu$$m deposited on an Si substrate, a PMMA layer having a thickness of $$sim$$ 10-$$mu$$m spin-coated onto the SiO$$_2$$ layer and a Y-junction waveguide with a width of 8-$$mu$$m in a PMMA core layer. The Y-junction waveguides with the angle of 2$$^{circ}$$ were drawn using the 1.7 MeV proton beam with 1-$$mu$$m in diameter and a beam current of 10 pA for a dose of 100 nC/mm$$^2$$. After spin-coating the PMMA layer with $$sim$$ 10-$$mu$$m thickness as an upper cladding on the irradiated PMMA layer, the near field pattern (NFP) of an 8-$$mu$$m-width Y-junction waveguide was observed using a tunable-wavelength laser. The observation showed that the fabrication of waveguide was succeeded because its waveguide was single mode and the intensity ratio between the two outputted lights was the almost same; 1:0.96. We also briefly report the next plans of the measurement of the refractive indices of proton-irradiated PMMA and SiO$$_2$$ films and the fabrication of a thermo-optic polymer switch based on a Mach-Zehnder interferometer waveguide.

論文

Microbeam complex at TIARA; Technologies to meet a wide range of applications

神谷 富裕; 高野 勝昌; 佐藤 隆博; 石井 保行; 西川 宏之*; 関 修平*; 杉本 雅樹; 奥村 進; 福田 光宏*

Nuclear Instruments and Methods in Physics Research B, 269(20), p.2184 - 2188, 2011/10

 被引用回数:12 パーセンタイル:26.02(Instruments & Instrumentation)

In order to meet wide variety of ion beam applications, three different types of ion microbeam systems were developed. These systems have shown the spatial resolutions of less than 1 $$mu$$m and have made it possible to irradiate minute targets or areas with positioning accuracies of less than 1 $$mu$$m. For micro-analyses, an in-air micro-PIXE system was originally developed on the light ion microbeam system. For micro-fabrication, technique of mask-less ion beam lithography was developed on the light-ion microbeam and other systems. Single-ion-hit technique was also realized to study single-event phenomena in semiconductors or biological cells induced by high-energetic heavy particles. On the other hand, the qualities of the beam from accelerators were important, such as stability of the intensity and the energy of the beams. In this paper, the latest progress and a future prospect of them were discussed.

論文

Nano-micro processing of epoxy resin systems by ion beam lithography with multiple energies and species

高野 勝昌; 佐藤 隆博; 石井 保行; 江夏 昌志; 神谷 富裕; 大久保 猛; 杉本 雅樹; 西川 宏之*; 関 修平*

Transactions of the Materials Research Society of Japan, 36(3), p.305 - 308, 2011/09

Techniques of superimposed ion beam writing with different energies and species have been developed with targeting system at Takasaki Ion Accelerators for Advanced Radiation Application facility, TIARA, of JAEA/Takasaki. A bridge structure was fabricated by the superimposed writing of a girder pattern with 0.5 MeV proton beam adjusting to the bridge pier pattern written with 3 MeV proton beam, using SU-8 photoresist films coated on curing epoxy resin sheets. An upstanding column array with the diameter of sub-micron supported by the bridge structure was fabricated by the spot writing of 260 MeV Ne$$^{7+}$$ single ion hit adjusting to the girder pattern written with the 0.5 MeV proton beams.

論文

Electroforming of Ni mold for imprint lithography using high-aspect-ratio PMMA microstructures fabricated by proton beam writing

田邊 祐介*; 西川 宏之*; 関 佳裕*; 佐藤 隆博; 石井 保行; 神谷 富裕; 渡辺 徹*; 関口 淳*

Microelectronic Engineering, 88(8), p.2145 - 2148, 2011/08

 被引用回数:7 パーセンタイル:54.63(Engineering, Electrical & Electronic)

Proton Beam Writing (PBW) is a direct-write technique using focused MeV proton beams. Electroforming Ni molds with high-aspect-ratio are developed for imprint lithography using master blocks of PMMA micro-structures fabricated by PBW. In this development, two problems happened as follows; the master blocks with unmelted PMMA remaining into the PMMA micro-structure in the etching process after PBW and the Ni molds with defectively transcriptional structures electroformed on the clear master blocks of its PMMA micro-structure. In this report, the two relations between the PMMA structures and the etching process and between their structures and the electroforming process were individually studied to solve the problems. In the conference, we will present the two problems, the several researches for their solutions and the trial production results of the electroforming Ni molds using the master blocks of the high-aspect-ratio PMMA micro-structures fabricated by PBW.

論文

Soft-lithographic methods for the fabrication of dielectrophoretic devices using molds by proton beam writing

椎根 康晴*; 西川 宏之*; 古田 祐介*; 金光 薫*; 佐藤 隆博; 石井 保行; 神谷 富裕; 中尾 亮太*; 内田 諭*

Microelectronic Engineering, 87(5-8), p.835 - 838, 2010/05

 被引用回数:5 パーセンタイル:61.97(Engineering, Electrical & Electronic)

Proton Beam Writing (PBW) is a direct writing process using a MeV focused proton beam. The previous performance examinations of the dielectrophoretic (DEP) devices, the high-aspect-ratio micro-structures with the pillar arrays and the fluidic channels fabricated by PBW, showed that spatially modulated electric fields were effective for trapping Escherichia coli. The reproduction of the DEP device using PBW only is, however, unsuitable because it takes a lot of time to fabricate complicated and large area structures. In this study, the fabrication technique of the micro fluidic channel, combining a soft lithography and PBW techniques, was introduced to improve the productivity of the DEP devices. The prototypes of DEP deceives including SU-8 high-aspect-ratio pillar arrays in the micro fluidic channel were developed using the fabrication technique. Especially the pillar arrays in these devices were produced by 1.0 or 1.7 MeV proton beams focused around 1 $$mu$$m in diameter. The observation of the DEP devices using an optical microscope image showed that the pillar arrays were successfully included in the micro fluidic channel. The prototyping capability of PBW combined with the soft lithography technique was highlighted by increasing the productivity of the DEP devices.

論文

Fabrication of nanowires by varying energy microbeam lithography using heavy ions at the TIARA

神谷 富裕; 高野 勝昌; 石井 保行; 佐藤 隆博; 及川 将一*; 大久保 猛; 芳賀 潤二*; 西川 宏之*; 古田 祐介*; 打矢 直之*; et al.

Nuclear Instruments and Methods in Physics Research B, 267(12-13), p.2317 - 2320, 2009/06

 被引用回数:6 パーセンタイル:53.63(Instruments & Instrumentation)

In TIARA facility of Japan Atomic Energy Agency (JAEA) Takasaki, three-dimensional micro/nano structures with high aspect ratio based on cross linking process in negative resist such as SU-8 have been produced by a technique of mask less ion beam lithography. By bombarding high-energy heavy ions such as 450 MeV Xe$$^{23+}$$ to SU-8, a nanowire could be produced just with a single ion hitting. Then we tried to produce nanowires, of which both ends were fixed in the three-dimensional structure. This paper shows a preliminary experiment using a combination of 15 MeV Ni$$^{4+}$$ ion microbeam patterning and the 450 MeV $$^{129}$$Xe$$^{23+}$$ hitting on SU-8.

論文

Development of micromachining technology in ion microbeam system at TIARA, JAEA

神谷 富裕; 西川 宏之*; 佐藤 隆博; 芳賀 潤二; 及川 将一*; 石井 保行; 大久保 猛; 打矢 直之; 古田 祐介*

Applied Radiation and Isotopes, 67(3), p.488 - 491, 2009/03

 被引用回数:4 パーセンタイル:65.85(Chemistry, Inorganic & Nuclear)

原子力機構高崎量子応用研究所のイオン加速器施設(TIARA)のマイクロビームにおいて、芝浦工業大学との共同研究で、マスクレスイオンビームリソグラフィ技術の開発が進められている。マイクロビームサイズ評価とレンズ系の最適化、又は空間分解能として最小100nmのレベルの高空間分解能の測定手段を確立するために、開発している加工技術自身と電鋳技術との組合せにより二次電子マッピングに使用する標準試料としてNiレリーフパターンを作成した。本発表ではこの標準試料を用いて、100nmレベルの最小のビームサイズを測定することができたことを述べるとともに、その試料中をイオンが透過する際の散乱効果が測定結果に与える影響をモンテカルロシミュレーションコードを使用して評価した結果について報告する。

論文

Evaluation of three dimensional microstructures on silica glass fabricated by ion microbeam

西川 宏之*; 惣野 崇*; 服部 雅晴*; 大木 義路*; 渡辺 英紀*; 及川 将一*; 荒川 和夫; 神谷 富裕

JAERI-Review 2003-033, TIARA Annual Report 2002, p.254 - 256, 2003/11

原研TIARAの軽イオン及び重イオンマイクロビーム装置を用い、マイクロビーム二次元走査によりフォトにクス基盤材料であるシリカガラスに導波、発光、調光機能を持つ微細な三次元構造を形成するための基礎研究を行った。細い短冊状にマイクロビーム照射した試料について顕微PL-ラマン分光及びAFMによるマッピングを行い、誘起される種々の構造変化を調べ、NBOHCによる650nmのPL帯の強度の分布、及び飛程近傍での高密度化による表面での凹部の生成が観測された。高品質なフォルター素子の作成を目指した光ファイバへのH$$^{+}$$マイクロビーム照射実験では、コア部の局所領域に屈折率変化を誘起することができた。

論文

Radiation effects and surface deformation of silica by ion microbeam

西川 宏之*; 惣野 崇*; 服部 雅晴*; 西原 義孝*; 大木 義路*; 渡辺 英紀*; 及川 将一*; 神谷 富裕; 荒川 和夫

Nuclear Instruments and Methods in Physics Research B, 191(1-4), p.342 - 345, 2002/05

 被引用回数:3 パーセンタイル:74.2(Instruments & Instrumentation)

シリカガラスを用い、MeVエネルギーのイオンマイクロビームの照射効果を顕微フォトルミネッセンス(PL)・ラマン分光器と原子間顕微鏡(AFM)を用いて調べた。フォトルミネッセンス測定では、非架橋酸素ラジカル(≡Si-O)による欠陥を示す650nm帯が、イオンの飛跡に沿って分布している。また、マイクロビームの走査照射により生じた表面形状変化をAFMを用いて調べた結果、表面形状変化はビーム走査幅とイオン到達深度に良く対応して生じていることを明らかにした。さらに、照射と未照射の境界領域に強いPL強度分布を示す部分が生成することを見出した。この境界領域では、シリカガラス内部の高密度化とそれに付随して生じた表面形状変化による応力が原因で生成した欠陥と考えられる。

論文

Gamma-ray-induced loss of Er$$^{3+}$$-doped silica-core optical fiber

小山 武志*; 道口 信行*; 大木 義路*; 西川 宏之*; 日馬 康雄; 瀬口 忠男

Japanese Journal of Applied Physics, 33(7A), p.3937 - 3941, 1994/07

 被引用回数:2 パーセンタイル:81.55(Physics, Applied)

エルビウムをドープした光ファイバに$$gamma$$線を照射し、損失の増加を解析した。損失は主としてEr$$^{3+}$$の還元により生成するEr$$^{2+}$$によって誘起されるが、Er$$^{3+}$$の濃度には依存しない。損失の増加はE$$gamma$$センターの生成式から導かれる2つの指数項と1つの直線項により表される。E$$gamma$$センターの生成に関するホールトラッピングが還元を誘起する電子を供給し、損失の増加に重要な役割を果たしていると考えられる。

論文

エルビウムドープ光ファイバにおける$$gamma$$線誘起損失の解析

小山 武志*; 道口 信行*; 西川 宏之*; 大木 義路*; 日馬 康雄; 瀬口 忠男

DEI-93-165, 0, p.11 - 19, 1993/12

希土類元素の一種であるエルビウム(Er)をドープした石英系光ファイバの$$gamma$$線照射による光学的・物理的特性を測定し、損失増加曲線を解して損失のメカニズムを考察した。

口頭

プロトンマイクロビーム描画によるレジストの微細加工

打矢 直之*; 原田 卓弥*; 西川 宏之*; 芳賀 潤二; 酒井 卓郎; 佐藤 隆博; 石井 保行; 神谷 富裕

no journal, , 

次世代半導体素子開発にはレジスト材を用いた露光技術の高度化が必須となっており、これを可能とするにはレジスト材のマイクロメートル以下の分解能で、高アスペクト比の微細加工が必要となっている。MeVエネルギー領域のH$$^+$$集束ビームを用いたProton Beam Writting(PBW)技術はこの微細加工を可能とする有力な技術の一つであり、現在原子力機構では芝浦工業大学との共同でPBW技術の開発を進めている。これまでの実験からポジ型(PMMA),ネガ型(SU-8)レジスト材への1.7MeV,H$$^+$$ビームの照射を行い、これらの材料の微細加工の適応性について検討を行ってきた。本報告ではビーム走査によりPMMA及びSU-8に任意形状の照射パターンを形成できること,H$$^+$$照射による物質中でのビームの散乱が小さいことを確認し、特に、SU-8ではアスペクト比約12の凸構造を確認できたので発表を行う。

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